Degradation studies of nitride-based low-e films

Kent E. Andersson; M. K. Wahlstrom; Arne Roos; Carl-Gustaf Ribbing

doi:10.1117/12.130492

25 November 1992 Degradation studies of nitride-based low-e films

Kent E. Andersson, M. K. Wahlstrom, Arne Roos, Carl-Gustaf Ribbing

Proceedings Volume 1727, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Selective Materials, Concentrators and Reflectors, Transparent Insulation and Superwindows; (1992) https://doi.org/10.1117/12.130492
Event: Optical Materials Technology for Energy Efficiency and Solar Energy, 1992, Toulouse-Labege, France

Abstract

Triple layer structures of TiO₂/TiN/TiO₂ and quadruple layer structures of TiO₂/Al/TiN/TiO₂ have been sputtered on glass substrates at temperatures ranging from room temperature to 300 degree(s)C. The reflectance and transmittance were measured in the visible and the near infrared wavelength regions. Accelerated degradation tests with respect to high temperature and acid exposure have been performed with these laboratory samples of low-e coatings and the degradation has been compared with that of commercial silver based window coatings. As expected the durability of the nitride based coatings is far superior to the stability of those based on noble metals. Furthermore, the nitride coatings with an aluminum sacrificial layer have been found to resist aging at elevated temperatures (as high as 350 - 400 degree(s)C) far better than similar coatings without the aluminum. It has also been shown that the aluminum layer protects the nitride film during deposition of the top oxide layer. The effects of high temperature annealing have been modeled with optical multilayer calculations. Comparison of two degradation mechanisms demonstrates that the silver layers fail by agglomeration while the nitride suffers successive oxidation. This explains the effectiveness of the aluminum layer which forms a dense oxide during the initial stages of TiO₂- deposition.

Citation Download Citation

Kent E. Andersson, M. K. Wahlstrom, Arne Roos, and Carl-Gustaf Ribbing "Degradation studies of nitride-based low-e films", Proc. SPIE 1727, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XI: Selective Materials, Concentrators and Reflectors, Transparent Insulation and Superwindows, (25 November 1992); https://doi.org/10.1117/12.130492

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KEYWORDS

Multilayers

Titanium

Oxides

Aluminum

Reflectivity

Tin

Transmittance

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