AXAF VETA-I mirror encircled energy measurements and data reduction

Ping Zhao; Mark D. Freeman; John P. Hughes; Edwin M. Kellogg; Dan T. Nguyen; Marshall K. Joy; Jeffery J. Kolodziejczak

doi:10.1117/12.140609

21 January 1993 AXAF VETA-I mirror encircled energy measurements and data reduction

Ping Zhao, Mark D. Freeman, John P. Hughes, Edwin M. Kellogg, Dan T. Nguyen, Marshall K. Joy, Jeffery J. Kolodziejczak

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140609
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

The AXAF VETA-I mirror encircled energy was measured with a series of apertures and two flow gas proportional counters at five X-ray energies ranging from 0.28 to 2.3 keV. The proportional counter has a thin plastic window with an opaque wire mesh supporting grid. Depending on the counter position, this mesh can cause the X-ray transmission to vary as much as +/- 9 percent, which directly translates into an error in the encircled energy. In order to correct this wire mesh effect, window scan measurements were made, in which the counter was scanned in both horizontal (Y) and vertical (Z) directions with the aperture fixed. Post VETA measurement of the VXDS setup were made to determine the exact geometry and position of the mesh grid. Computer models of the window mesh were developed to simulate the X-ray transmission based on this measurement. The window scan data were fitted to such mesh models and corrections were made. After this study, the mesh effect was well understood and the final results of the encircled energy were obtained with an uncertainty of less than 0.8 percent.

Citation Download Citation

Ping Zhao, Mark D. Freeman, John P. Hughes, Edwin M. Kellogg, Dan T. Nguyen, Marshall K. Joy, and Jeffery J. Kolodziejczak "AXAF VETA-I mirror encircled energy measurements and data reduction", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140609

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