Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

Katsuhiko Murakami; Hiroshi Nakamura; Tetsuya Oshino; Masayuki Ohtani; Hiroshi Nagata

doi:10.1117/12.140572

21 January 1993 Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino, Masayuki Ohtani, Hiroshi Nagata

Author Affiliations +

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140572
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Molybdenum/silicon multilayers were deposited by ion beam sputtering and radio-frequency magnetron sputtering. X-ray reflection, transmission electron microscopy and Auger electron spectroscopy studies were performed to characterize these multilayers. There was a difference in soft x-ray reflectivity. The reason for the difference was found to be the difference in the thickness of silicide layers which were formed at each interface of the multilayers.

Citation Download Citation

Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino, Masayuki Ohtani, and Hiroshi Nagata "Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140572

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