Wavelength dependence of scatter in chemical-vapor-deposited SiC

Jitendra Singh Goela; Michael A. Pickering; Raymond L. Taylor

doi:10.1117/12.140693

12 February 1993 Wavelength dependence of scatter in chemical-vapor-deposited SiC

Jitendra Singh Goela, Michael A. Pickering, Raymond L. Taylor

Proceedings Volume 1753, Stray Radiation in Optical Systems II; (1993) https://doi.org/10.1117/12.140693
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Bidirectional reflectance distribution function has been measured on highly polished uncoated and silver coated samples of CVD SiC in the wavelength range 0.325-10.6 microns to determine the dependence of scatter as a function of wavelength. From these data, total integrated scatter, the power spectral density as function of spatial frequency, and the root mean square surface roughness were calculated. The results indicate that the uncoated CVD-SiC scatter topographically (i.e., follow the lambda exp -4 scaling law) in the wavelength region, 0.325-1.06 micron but not in the region, 1.06-10.6 microns. At 10.6 microns, CVD-SiC exhibits unusually large surface scatter which can be significantly improved by coating CVD-SiC with a thin layer of silver.

Citation Download Citation

Jitendra Singh Goela, Michael A. Pickering, and Raymond L. Taylor "Wavelength dependence of scatter in chemical-vapor-deposited SiC", Proc. SPIE 1753, Stray Radiation in Optical Systems II, (12 February 1993); https://doi.org/10.1117/12.140693

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