Neural-net concept for fabricating HOE in photoresist

Rang-Seng Chang; Yeu-Jent Hu; Chern-Sheng Lin

doi:10.1117/12.155018

17 September 1993 Neural-net concept for fabricating HOE in photoresist

Rang-Seng Chang, Yeu-Jent Hu, Chern-Sheng Lin

Proceedings Volume 1914, Practical Holography VII: Imaging and Materials; (1993) https://doi.org/10.1117/12.155018
Event: IS&T/SPIE's Symposium on Electronic Imaging: Science and Technology, 1993, San Jose, CA, United States

Abstract

In this paper, the neural net concept is applied to obtain the desired process parameters in HOE (holographic optical element) fabrication with a photoresist material. A very important step for HOE fabr:icating process is to decide the values of parameters from procedure for making photoresist hologram. The technique of image processing is adopted to solve the massive amount of work in the data base of surface relief grating fringes patterns recognition. From our analysis, the relationships of the fringes profile of photoresist and the process parameters are created and may be updated according to the new conditions. Experimental results of HOE fabrication show agreement with the predicted results.

Citation Download Citation

Rang-Seng Chang, Yeu-Jent Hu, and Chern-Sheng Lin "Neural-net concept for fabricating HOE in photoresist", Proc. SPIE 1914, Practical Holography VII: Imaging and Materials, (17 September 1993); https://doi.org/10.1117/12.155018

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