Design of PACs for high-performance photoresists (II): effect of number and orientation of DNQs and -OH of PACs on lithographic performances

Ryotaro Hanawa; Yasunori Uetani; Makoto Hanabata

doi:10.1117/12.154756

15 September 1993 Design of PACs for high-performance photoresists (II): effect of number and orientation of DNQs and -OH of PACs on lithographic performances

Ryotaro Hanawa, Yasunori Uetani, Makoto Hanabata

Author Affiliations +

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154756
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

PACs which have a defined number of DNQs and -OH groups were synthesized with high yield by the selective esterification method, and the relationship between number and orientation of DNQs, and lithographic performances and dissolution properties, were examined and measured by puddle development. From our present and previous examinations, it is concluded that existence of one -OH group and two DNQs, which are separated from each other on a ballast molecule, is the most preferable structure of PAC, which provides a photoresist not only a high (gamma) -value and resolution capability but also suitable sensitivity and a scum-free pattern. According to concept of polyphotolysis results are discussed quantitatively by dissolution inhibition effect and the number of DNQs of the PAC.

Citation Download Citation

Ryotaro Hanawa, Yasunori Uetani, and Makoto Hanabata "Design of PACs for high-performance photoresists (II): effect of number and orientation of DNQs and -OH of PACs on lithographic performances", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154756

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