Effect of ultraviolet curing temperature on the state of stress and mechanical properties of photoresists

Jeffrey F. Taylor; Quinn K. Tong; Richard J. Farris

doi:10.1117/12.154780

15 September 1993 Effect of ultraviolet curing temperature on the state of stress and mechanical properties of photoresists

Jeffrey F. Taylor, Quinn K. Tong, Richard J. Farris

Author Affiliations +

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154780
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Ultraviolet curing, typical during processing of photoresist coatings, often results in residual stress. This stress is critical since it is the driving force for failure in a coating. Increasing the stress usually corresponds to a decrease in the mechanical performance. The source of residual stress was illustrated to be a result of thermal expansion mismatch between the substrate and the coating during the cooling stage following UV cure. The objective of this investigation was to reduce the residual stress by decreasing the ultraviolet curing temperature. A photoresist coating was UV cured at 3 different temperatures and the state of stress and mechanical properties were evaluated. A reduction in the state of stress of the photoresist coating was observed. Using incremental elasticity, this reduction in stress was determined to be primarily a result of decreasing the thermal stresses associated with cooling. When the cure temperature was close to the glass transition temperature, a decrease in the ultimate strength and modulus were observed, which was attributed to a decrease in the efficiency of the crosslinking reaction present during UV cure.

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Jeffrey F. Taylor, Quinn K. Tong, and Richard J. Farris "Effect of ultraviolet curing temperature on the state of stress and mechanical properties of photoresists", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154780

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