Evolution of a microlens surface under etching conditions

Edward John Gratrix

doi:10.1117/12.165697

15 December 1993 Evolution of a microlens surface under etching conditions

Edward John Gratrix

Proceedings Volume 1992, Miniature and Micro-Optics and Micromechanics; (1993) https://doi.org/10.1117/12.165697
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

This paper discusses the effects of an etching process on the optical figure of a microlens transferred from photoresist to an underlying substrate. I state a general equation for the evolution of a surface under etching conditions. I then show how isotropic and anisotropic etching conditions behave within this surface evolution theory. I demonstrate how ion milling is not an anisotropic process when eroding 3-D surfaces. Finally, I show that this behavior leads to aberrations in microlenses when subjected to ion milling as a pattern transfer technique.

Citation Download Citation

Edward John Gratrix "Evolution of a microlens surface under etching conditions", Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); https://doi.org/10.1117/12.165697

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