Paper
1 February 1994 Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist
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Abstract
Progress in the fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist followed by replication into epoxy or polymer materials is described. The technology enables a wide range of micro-optical elements to be fabricated and replicated using Ni shims electroformed from the photoresist originals. Examples of fabricated micro- optical elements are described, including microlens arrays, Fresnel microlenses, kinoforms, and other continuous microrelief phase elements.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Gale, Markus Rossi, and Helmut Schuetz "Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresist", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167542
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CITATIONS
Cited by 26 scholarly publications.
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KEYWORDS
Photoresist materials

Optical components

Nickel

Photoresist developing

Computer generated holography

Microlens

Surface roughness

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