Automatic defects classification for photolithographics reticles

Denis M. Rigaill; Henry Roussel-Dupre; Michel Tissier; Yann Guerin

doi:10.1117/12.167264

15 February 1994 Automatic defects classification for photolithographics reticles

Denis M. Rigaill, Henry Roussel-Dupre, Michel Tissier, Yann Guerin

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167264
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

Abstract not available.

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Denis M. Rigaill, Henry Roussel-Dupre, Michel Tissier, and Yann Guerin "Automatic defects classification for photolithographics reticles", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167264

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