Printability of phase-shift defects using a perturbational model

Robert John Socha; Andrew R. Neureuther

doi:10.1117/12.167269

15 February 1994 Printability of phase-shift defects using a perturbational model

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167269
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

A perturbational model which describes the printability of defects in phase-shift masks (PSM) as a function of focus position is presented and used along with the SPLAT to generate design data on tolerable defect size as a function of defect phase. Defects in a clear field mask with phases other than 180 degrees have the greatest tendency to print when out of focus. From a reformulation of the perturbational model, the tendency to print when out of focus can be explained by the combination of the phase contributed by defocus in the defect image with the phase of the light passing through the defect. To assess the printability of defects, the impact of defects near features in thin chrome attenuating PSM and embedded attenuating PSM were evaluated by calculating the image linewidth variation.

Citation Download Citation

Robert John Socha and Andrew R. Neureuther "Printability of phase-shift defects using a perturbational model", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167269

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