Paper
13 May 1994 Neon dense plasma focus point x-ray source for ≤ 0.25 um lithography
Rahul R. Prasad, Mahadevan Krishnan, Joseph Mangano, Philip A. Greene, Niansheng Qi
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Abstract
A discharge driven, dense plasma focus (DPF) in Neon has been developed at SRL as a point x-ray source for sub-micron lithography. This source is presently capable of delivering approximately 25 J/pulse of Neon K-shell x rays (8 - 14 angstrom) into 4 (pi) steradians with an approximately equals 1.4% wall plug efficiency at a 20 Hz repetition rate. This corresponds to 500 W of average x-ray power. The discharge is produced by a capacitor bank circuit (8 kV, 1.8 kJ) that drives approximately equals 320 kA currents into the DPF load, with approximately equals 1 microsecond(s) rise-times. X rays are produced when a dense pinch of Neon is formed along the axis of the DPF electrodes. Four X ten5 discharges using a cooled DPF head have been fired producing x rays. The variation in the measured x-ray output, over several 104 shots, corresponds to a variation in the dose delivered to a resist 40 cm from the source, of less than 1%. Data showing the measurement of the x-ray output, size, dose delivered to a resist, spectra of the source output, novel beam line concepts, and potential lithographic applications are discussed.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rahul R. Prasad, Mahadevan Krishnan, Joseph Mangano, Philip A. Greene, and Niansheng Qi "Neon dense plasma focus point x-ray source for ≤ 0.25 um lithography", Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); https://doi.org/10.1117/12.175797
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Cited by 13 scholarly publications.
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KEYWORDS
X-rays

Neon

Lithography

X-ray sources

Plasma

Aluminum

Electrodes

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