"On wafer" measurement of mask-induced overlay error

Paolo Canestrari; Giovanni Rivera; C. Lietti

doi:10.1117/12.174161

1 May 1994 "On wafer" measurement of mask-induced overlay error

Paolo Canestrari, Giovanni Rivera, C. Lietti

Proceedings Volume 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII; (1994) https://doi.org/10.1117/12.174161
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

In this paper we present the results of an evaluation into the effects of mask unflatness on the overlay budget. We have investigated two different situations: firstly the case of a single sided telecentric lens and secondly that of a double telecentric one. The results have been determined by measuring this effect directly on wafer.

Citation Download Citation

Paolo Canestrari, Giovanni Rivera, and C. Lietti ""On wafer" measurement of mask-induced overlay error", Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); https://doi.org/10.1117/12.174161

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