Analyzing deep-UV lens aberrations using aerial image and latent image metrologies

Eric L. Raab; Christophe Pierrat; Charles H. Fields; Robert L. Kostelak; William G. Oldham; Sheila Vaidya

doi:10.1117/12.175450

17 May 1994 Analyzing deep-UV lens aberrations using aerial image and latent image metrologies

Eric L. Raab, Christophe Pierrat, Charles H. Fields, Robert L. Kostelak, William G. Oldham, Sheila Vaidya

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175450
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The technique of direct aerial image metrology (AIM) has been applied to characterize the performance of a microlithographic lens. AIM is potentially faster and more reproducible than measurements obtained by scanning electron microscopy. Direct measurement of the aerial image eliminates both the process variations associated with resist processing as well as the subjective nature of evaluating resist profiles. We have used AIM to evaluate some of the primary aberrations of a 248 nm stepper lens. We compare the results to those obtained with latent image scatterometry, a proven technique for measuring lens performance. We found that AIM, while providing qualitatively good results, contained some slight systematic errors that reduced the accuracy of the data. The sources of error and their remedies are discussed.

Citation Download Citation

Eric L. Raab, Christophe Pierrat, Charles H. Fields, Robert L. Kostelak, William G. Oldham, and Sheila Vaidya "Analyzing deep-UV lens aberrations using aerial image and latent image metrologies", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175450

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