Paper
6 July 1994 Nonlinear material requirements for passive optical limiting in an optical imaging system
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Abstract
Intensity dependent nonlinear materials placed at an intermediate focal plane in a simple two lens optical imaging system will limit radiation on a detector plane. We report the dependence of the energy and fluence limiting on aperture size, nonlinear material position, and the magnitude of the nonlinearity. The approximate performance of this same imaging system is determined for a laser source located far from the limiter. The nonlinear material requirements to limit the fluence at or below some predetermined level is determined. A dynamic range for the limiting behavior is determined which includes damage to the nonlinear material.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gary L. Wood and Andrew G. Mott "Nonlinear material requirements for passive optical limiting in an optical imaging system", Proc. SPIE 2229, Nonlinear Optical Materials for Switching and Limiting, (6 July 1994); https://doi.org/10.1117/12.179581
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KEYWORDS
Imaging systems

Complex systems

Nonlinear optics

Optical imaging

Optical limiting

Laser sources

Sensors

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