Removal of surface contaminants using a chemical-free laser-assisted process

Audrey C. Engelsberg

doi:10.1117/12.190151

19 October 1994 Removal of surface contaminants using a chemical-free laser-assisted process

Audrey C. Engelsberg

Proceedings Volume 2261, Optical System Contamination: Effects, Measurements, and Control IV; (1994) https://doi.org/10.1117/12.190151
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

Contamination control is a critical issue to the manufacture and maintenance of optical components. Particulates and thin films (organic and inorganic) can degrade optical performance. Current cleaning methods are focusing on aqueous-based cleaning and super- critical fluids. Concurrently, environmentally-conscious manufacturing processes are becoming essential for industrial applications. These manufacturing processes emphasize the reduction of water and chemical consumption and hazardous waste production. In this paper, we will introduce a chemical-free laser assisted process that has demonstrated its capability of removing particulates and films from various surfaces including optical. Since this process works with energy flux and a flowing inert gas, it's readily adaptable and cost effective for many industrial applications.

Citation Download Citation

Audrey C. Engelsberg "Removal of surface contaminants using a chemical-free laser-assisted process", Proc. SPIE 2261, Optical System Contamination: Effects, Measurements, and Control IV, (19 October 1994); https://doi.org/10.1117/12.190151

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