Lithography and the future of Moore's law

Gordon E. Moore

doi:10.1117/12.210341

9 June 1995 Lithography and the future of Moore's law

Gordon E. Moore

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210341
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The definition of `Moore's Law' has come to refer to almost anything related to the semiconductor industry that when plotted on semi-log paper approximates a straight line. I hesitate to review its origins and by doing so restrict its definition. However, this paper is a review of the history and past performance relative to predictions and shows where the advances have come from. I will leave the future performance up to you. Certainly continuing on the same slope doesn't get any easier. It presents a difficult challenge to the industry.

Citation Download Citation

Gordon E. Moore "Lithography and the future of Moore's law", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210341

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