Metrology versus detection strategies for sub-half-micrometer reticles

Mircea V. Dusa; Linard Karklin

doi:10.1117/12.209207

22 May 1995 Metrology versus detection strategies for sub-half-micrometer reticles

Mircea V. Dusa, Linard Karklin

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209207
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The 'edge detection' is a known problem in optical linewidth metrology. New illumination capabilities like Real Time Broad Band Confocal Scanning, the combination of conventional transmitted illumination with real time confocal scanning, or the use of UV transmitted illumination, together with the use of finite transmissive/reflective masks require a reevaluation of the traditional edge detection approach. Edge response function and Edge response width were reviewed for confocal scanning illumination and for typical finite transmissive (binary) masks. The proposed edge detection strategy deals with edge position shift with detection threshold in different illumination conditions and the relationship between the detection threshold and 'best' focal plane selected for measurement. 'Edge roughness', another known problem was reviewed from different prospectives and measurements of the edge roughness were performed at various edge detection thresholds. Mapping of mask feature 'aerial intensity' was used to view the edge roughness, edge slope and to locate edge position. Aerial intensity simulations with SOLID-C simulation tool were in good agreement with the experimental data. The edge analysis strategy helped to obtain consistent 3S repeatability of less than 8 nm and good accuracy on various masks substrates, like resist develop-inspect, half tone attenuated and chromeless.

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Mircea V. Dusa and Linard Karklin "Metrology versus detection strategies for sub-half-micrometer reticles", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209207

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KEYWORDS

Confocal microscopy

Edge roughness

Photomasks

Edge detection

Metrology

Imaging systems

Halftones

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