In-situ optimization of an i-line optical projection lens

Chunsheng Huang

doi:10.1117/12.209300

26 May 1995 In-situ optimization of an i-line optical projection lens

Chunsheng Huang

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209300
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

An in-situ process has been developed to optimize lens element alignment on a wafer stepper. This technique evaluates and analyzed the optical wavefront using the photoresist line and space profile. The advantage of this technique is that the photoresist sensitivity to the optical wavefront of the lens is automatically considered in the optimization process. The technique uses theoretical prediction and empirical critical dimension (CD) data to adjust the projection lens for optimum performance on the stepper. Successful implementation in production has been achieved. While the procedure has been developed on a high efficiency 1X projection lens, it can also be implemented on a reduction lens.

Citation Download Citation

Chunsheng Huang "In-situ optimization of an i-line optical projection lens", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209300

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