Influence of deposition parameters on optical properties of titanium nitride thin films

Viorel Braic; Mariana Braic; Gabriela Pavelescu; Dorin Melinte; Dana Necsoiu

doi:10.1117/12.203490

8 March 1995 Influence of deposition parameters on optical properties of titanium nitride thin films

Viorel Braic, Mariana Braic, Gabriela Pavelescu, Dorin Melinte, Dana Necsoiu

Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203490
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania

Abstract

The thin titanium nitride films deposited on glass in a planar d.c. magnetron configuration have been optically investigated. The influence of the nitrogen partial pressure, substrate bias and film thickness as deposition parameters on the transmission (Vis) and the reflectance (Vis, FIR) spectra of the samples was studied. The analysis of surface properties of TiN films was also made by spectroscopic ellipsometry for different deposition conditions. The data were compared with the similar spectrum of a gold evaporated film.

Citation Download Citation

Viorel Braic, Mariana Braic, Gabriela Pavelescu, Dorin Melinte, and Dana Necsoiu "Influence of deposition parameters on optical properties of titanium nitride thin films", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); https://doi.org/10.1117/12.203490

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