Excimer laser assisted TiN and WC removal from tools as a novel decoating technology

Emil Schubert; K. Schutte; A. Emmel; Hans Wilhelm Bergmann

doi:10.1117/12.204987

31 March 1995 Excimer laser assisted TiN and WC removal from tools as a novel decoating technology

Emil Schubert, K. Schutte, A. Emmel, Hans Wilhelm Bergmann

Proceedings Volume 2502, Gas Flow and Chemical Lasers: Tenth International Symposium; (1995) https://doi.org/10.1117/12.204987
Event: Gas Flow and Chemical Lasers: Tenth International Symposium, 1994, Friedrichshafen, Germany

Abstract

Hard coatings, e.g. TiN or WC on high quality tools are regenerated several times, due to their high costs. Conventional decoating techniques are of chemical nature and problematically regarding the handling of the chemical residues. In addition to that the lifetime of recoated tools after chemical decoating of the damaged functional layers is drastically reduced compared to new tools. Excimer laser treatment using the so-called `Duplex-Technique' enables a damage-free removal of the hard coatings with much longer lifetime of recoated tools than those of chemically decoated. The handling of the waste material is extremely easy using a laser processing head with an integrated exhaust system, that was designed at ATZ- EVUS. The paper gives a detailed presentation of the developed Duplex-Technique, the influence of the laser parameters and the obtained surface properties. Results of internal stress measurements, roughness values, changes in chemical composition and the surface appearance are described. From the technological point of view the removal rates, the productivity and last not least the superior performance of excimer laser decoated and PVD recoated tools in a lifetime test are demonstrated, compared to newly coated and chemical decoated tools.

Citation Download Citation

Emil Schubert, K. Schutte, A. Emmel, and Hans Wilhelm Bergmann "Excimer laser assisted TiN and WC removal from tools as a novel decoating technology", Proc. SPIE 2502, Gas Flow and Chemical Lasers: Tenth International Symposium, (31 March 1995); https://doi.org/10.1117/12.204987

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