Paper
3 July 1995 Fully automated mask/reticle production factory
Osamu Tsubakida, T. Ban, T. Kojima, Akira Morishige, T. Yoshizawa
Author Affiliations +
Abstract
Recently, very importance has been placed on the quality, delivery, and production cost of masks/reticles as factors relating to the fabrication of high-density devices. These factors have a significant bearing on the success in the device business. In addition, quality requirements for masks/reticles are becoming more and more tightening. To fulfill these requirements, it has been considered necessary to automate production processes. Automation of mask/reticle production has been difficult because the market is small and the development of such automation has been expensive. Therefore, it has been recognized that old-type mask/reticle factories must be turned into automated factories at inexpensively and efficiently.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Osamu Tsubakida, T. Ban, T. Kojima, Akira Morishige, and T. Yoshizawa "Fully automated mask/reticle production factory", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212809
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Atmospheric particles

Reticles

Manufacturing

Particles

Silicon

Cleaning equipment

Etching

RELATED CONTENT

Progress on EUV pellicle development
Proceedings of SPIE (April 17 2014)
Dry Cleaning Of 10X Masks
Proceedings of SPIE (September 20 1976)
Stencil mask key parameter measurement and control
Proceedings of SPIE (July 21 2000)
A short-pulsed laser cleaning system for EUVL tool
Proceedings of SPIE (March 21 2007)

Back to Top