Micromachined electron gun array (MEGA)

Noel C. MacDonald; Wolfgang Hofmann; Liang-Yuh Chen; John H. Das

doi:10.1117/12.221612

25 September 1995 Micromachined electron gun array (MEGA)

Noel C. MacDonald, Wolfgang Hofmann, Liang-Yuh Chen, John H. Das

Proceedings Volume 2522, Electron-Beam Sources and Charged-Particle Optics; (1995) https://doi.org/10.1117/12.221612
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

We present the Micro-machined Electron Gun Array (MEGA) as a massively-parallel approach to high throughput production electron beam lithography. The fabrication of the various components of the MEGA are described and the electron optical properties of micro- machined electron guns (MEGs) are studied using electron-optical simulation software. Electron-electron interaction between multiple beams is studied through Monte Carlo simulations for a number of configurations.

Citation Download Citation

Noel C. MacDonald, Wolfgang Hofmann, Liang-Yuh Chen, and John H. Das "Micromachined electron gun array (MEGA)", Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); https://doi.org/10.1117/12.221612

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available