Intelligent ground-rule-based inspection of OPC masks

Robert P. Bishop

doi:10.1117/12.228211

8 December 1995 Intelligent ground-rule-based inspection of OPC masks

Robert P. Bishop

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228211
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

Optical proximity correction (OPC) is incorporated in a mask to compensate for the resolution limits of the exposure system. Specific design rules and knowledge about the lens (NA), illumination coherence, and other process parameters are used by the mask designer to determine the type and location of each OPC feature. Beltronics describes how our UVscan System can inspect an OPC mask by intelligently applying the same set of design rules, or a derivative thereof, to inspect the mask. Incorrectly placed, and damaged OPC features are detected without the use of a reference image. Deep UV 248 nm optics are incorporated to obtain 0.125 micron resolution.

Citation Download Citation

Robert P. Bishop "Intelligent ground-rule-based inspection of OPC masks", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228211

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