Paper
8 December 1995 Simplified rule generation for automated rules-based optical enhancement
Oberdan W. Otto, Joseph G. Garofalo, Richard C. Henderson
Author Affiliations +
Abstract
This paper demonstrates a new methodology called parametric anchoring in which a small number of representative line-space measurements are used to match a given lithographic process to computational models for a rule-based optical enhancement scheme. The rule generation program, SimRuleTM, which incorporates the models, is used to create the rule lookup tables which are in turn used by the rules-based correction program, OPRXTM. Parametric anchoring is performed before the rule tables are computed, as distinguished from the earlier anchoring approach in which the multi-dimensional rule tables are reshaped to match a number of measured points. Parametric anchoring uses line and space measurements which are familiar to process engineers.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oberdan W. Otto, Joseph G. Garofalo, and Richard C. Henderson "Simplified rule generation for automated rules-based optical enhancement", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228212
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KEYWORDS
Process modeling

Optical proximity correction

Data modeling

Process engineering

Critical dimension metrology

Computational lithography

Diffusion

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