X-ray mask fabrication techniques for micromachining

Yuli Vladimirsky; Olga Vladimirsky; Volker Saile; Kevin J. Morris; J. Michael Klopf

doi:10.1117/12.228193

8 December 1995 X-ray mask fabrication techniques for micromachining

Yuli Vladimirsky, Olga Vladimirsky, Volker Saile, Kevin J. Morris, J. Michael Klopf

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228193
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

In this paper we present specifics of x-ray mask fabrication suitable for high-aspect ratio microlithography in micromachining. Results of fabrication and exposures using x-ray masks with approximately 4 micrometer thick gold absorber (one level resist) are illustrated. For conventional x-ray masks commercially available substrates were used: B-doped Si membrane (2-3 micrometers thick) on a 4' Si wafer bonded to a Pyrex glass ring. A new approach -- the transfer mask technique -- is demonstrated. This technique is based on forming an absorber pattern directly onto the resist surface of the sample. The transfer mask method is suitable for any radiation (visible, UV, and x-rays) and is based on the use of a master mask (optical or x- ray) to achieve patterns with desired aspect ratio. When used in conjunction with multiple x- ray exposures and sequential developments the transfer mask method produces patterns with extremely high aspect ratio.

Citation Download Citation

Yuli Vladimirsky, Olga Vladimirsky, Volker Saile, Kevin J. Morris, and J. Michael Klopf "X-ray mask fabrication techniques for micromachining", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228193

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