Paper
27 May 1996 Review of the state-of-the-art measurements for and the phenomenon of anomalously low thermal conductivities of dielectric thin films
Joseph A. Carpenter Jr.
Author Affiliations +
Abstract
Over the past decade, researchers in the laser optics, semiconductor electronics, and solid- state physics fields have shown that thin films of dielectrics a few micrometers or less in thickness can have measured thermal conductivities values significantly lower than if in normal bulk form. The values can be lower by several orders of magnitude and often decrease with decreasing film thickness. These phenomena have been observed in thin films of various dielectrics deposited or grown by various methods on various substrates. Preliminary explanations for these observations have centered around atomic- or molecular-sized defects or distortions in conjunction with high thermal resistances at or near the interface between the thin film and the substrate. This work has also fostered the initial development and assessment of apparently viable techniques for making measurements of thermal conductivities of thin films in the direction normal to the interface. The state-of-the-art of this work is reviewed.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph A. Carpenter Jr. "Review of the state-of-the-art measurements for and the phenomenon of anomalously low thermal conductivities of dielectric thin films", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240366
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Cited by 3 scholarly publications.
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KEYWORDS
Thin films

Silicon

Dielectrics

Interfaces

Resistance

Silica

Aluminum

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