Nanoscale processing by gas-cluster ion beams: novel technique in ion-beam processing

Isao Yamada; Jiro Matsuo

doi:10.1117/12.237050

26 April 1996 Nanoscale processing by gas-cluster ion beams: novel technique in ion-beam processing

Isao Yamada, Jiro Matsuo

Proceedings Volume 2779, 3rd International Conference on Intelligent Materials and 3rd European Conference on Smart Structures and Materials; (1996) https://doi.org/10.1117/12.237050
Event: 3rd International Conference on Intelligent Materials, 1996, Lyon, France

Abstract

Gas cluster ion beam techniques have been developed for nanoscale surface processing. Bombarding process fundamentals are distinctly different than those produced by conventional monomer ion irradiation. The unique characteristics of gas cluster ion bombardment are low energy and high current effects. Multiple collision during the bombardment solid surface produces complicate nonlinear effects. Very shallow ion implantation, low damage and high rate lateral sputtering and low temperature thin film formation are suggested application fields and have been experimentally demonstrated.

Citation Download Citation

Isao Yamada and Jiro Matsuo "Nanoscale processing by gas-cluster ion beams: novel technique in ion-beam processing", Proc. SPIE 2779, 3rd International Conference on Intelligent Materials and 3rd European Conference on Smart Structures and Materials, (26 April 1996); https://doi.org/10.1117/12.237050

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