New x-y stage for precision positioning and scanning

Paul D. Atherton; Ying Xu; Malachy McConnell

doi:10.1117/12.259035

20 November 1996 New x-y stage for precision positioning and scanning

Paul D. Atherton, Ying Xu, Malachy McConnell

Proceedings Volume 2865, Actuator Technology and Applications; (1996) https://doi.org/10.1117/12.259035
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

In recent years there has been an increasing need of ultra precision positioning and scanning systems with nanometer, or even subnanometer, resolution and accuracy. To meet the demand requires the development of new design concepts and techniques. A newly developed x-y stage is introduced in the paper. The stage was mainly designed for applications in SPMs, with subnanometer resolution and equivalent repeatability over a 50 by 50 micrometers scanning range. The yaw, roll and pitch errors of the stage are 2 arcsec., 0.8 arcsec., and 0.8 arcsec., respectively for the whole range. Some design considerations, such as stiffness, settling time and distortion of the frame are discussed. The experimental results are presented and its application in SPM demonstrated.

Citation Download Citation

Paul D. Atherton, Ying Xu, and Malachy McConnell "New x-y stage for precision positioning and scanning", Proc. SPIE 2865, Actuator Technology and Applications, (20 November 1996); https://doi.org/10.1117/12.259035

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