CO-OP DOE foundry process results

Thomas R. Werner; J. Allen Cox; J. Gieske; K. Hewitt; Kannan Raj; Ravindra A. Athale

doi:10.1117/12.274405

15 May 1997 CO-OP DOE foundry process results

Thomas R. Werner, J. Allen Cox, J. Gieske, K. Hewitt, Kannan Raj, Ravindra A. Athale

Proceedings Volume 3010, Diffractive and Holographic Device Technologies and Applications IV; (1997) https://doi.org/10.1117/12.274405
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

The DARPA-funded Consortium for Optical and Optoelectronic Technologies for Computing (CO-OP) recently completed the first DOE Foundry run delivering ten samples to each of nineteen users, each with a unique design. The binary optics process was used to provide a maximum of eight phase levels at a design wavelength of 850 nm. Averaged over all users and all samples, an etch depth error of one percent and alignment accuracy within 0.25 micron were achieved. This paper summarizes the details of the process results.

Citation Download Citation

Thomas R. Werner, J. Allen Cox, J. Gieske, K. Hewitt, Kannan Raj, and Ravindra A. Athale "CO-OP DOE foundry process results", Proc. SPIE 3010, Diffractive and Holographic Device Technologies and Applications IV, (15 May 1997); https://doi.org/10.1117/12.274405

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