Real-time machine vision for semiconductor manufacturing

Edward T. Polkowski

doi:10.1117/12.270350

3 April 1997 Real-time machine vision for semiconductor manufacturing

Edward T. Polkowski

Proceedings Volume 3028, Real-Time Imaging II; (1997) https://doi.org/10.1117/12.270350
Event: Electronic Imaging '97, 1997, San Jose, CA, United States

Abstract

Real-time vision has many applications in the area of semiconductor manufacturing. Typical processes use machine vision for alignment, inspection, measurement, process control, and quality control. This paper describes one application where machine vision is used in conjunction with a diffraction based optical technique to measure linewidth for use in critical dimension control.

Citation Download Citation

Edward T. Polkowski "Real-time machine vision for semiconductor manufacturing", Proc. SPIE 3028, Real-Time Imaging II, (3 April 1997); https://doi.org/10.1117/12.270350

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available