Simulation of reflective notching with TEMPEST

Thomas V. Pistor; Andrew R. Neureuther

doi:10.1117/12.276039

7 July 1997 Simulation of reflective notching with TEMPEST

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276039
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Reflective notching from projection printing a narrow feature over a reflective topography was simulated with the 3D electro-magnetic simulation program TEMPEST. Various topographical and optical parameters were varied to determine their effect on the reflective notching and to gain insight into the mechanism of reflective notching. It was determined that corner angles in the topography and anti-reflection coating use are important parameters while resist surface angle and polarization are not.

Citation Download Citation

Thomas V. Pistor and Andrew R. Neureuther "Simulation of reflective notching with TEMPEST", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276039

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