Paper
17 September 1997 Interferometric measurement of refractive index profiles for thin film characterization
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Proceedings Volume 3098, Optical Inspection and Micromeasurements II; (1997) https://doi.org/10.1117/12.281190
Event: Lasers and Optics in Manufacturing III, 1997, Munich, Germany
Abstract
Laser interferometric methods for measurement of refractive index profiles of thin film structure have been investigated experimentally and by computer simulation. An expression for the axial image, which incorporates multiple reflections and refractive distortion, has been derived. An algorithm for reconstruction of the profile from an axial image has been developed. The limitations of this approach have been investigated. The optical system produces a high-pass filtered reconstruction of the refractive index profile. For the approximation when multiple scattering and refractive distortion can be neglected, the results have been generalized to the problem of measurement of 3D refractive index variations from 3D images.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Colin J. R. Sheppard "Interferometric measurement of refractive index profiles for thin film characterization", Proc. SPIE 3098, Optical Inspection and Micromeasurements II, (17 September 1997); https://doi.org/10.1117/12.281190
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KEYWORDS
Refractive index

Reflection

Thin films

Distortion

Interfaces

Dielectrics

Interferometry

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