Oxidation kinetics for metal-dielectric films using IR optical measurements

Tuquabo Tesfamichael; Stefan K. Andersson; T. Chibuye; Ewa Wackelgard

doi:10.1117/12.290211

14 October 1997 Oxidation kinetics for metal-dielectric films using IR optical measurements

Tuquabo Tesfamichael, Stefan K. Andersson, T. Chibuye, Ewa Wackelgard

Proceedings Volume 3138, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XV; (1997) https://doi.org/10.1117/12.290211
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

The thermal oxidation of small metallic particles have been studied using infrared spectroscopy. The oxidation has been quantified by measuring the absorption of p-polarized light at 60 degree angle of incidence at the wavelengths around the longitudinal optical (LO) phonon mode of the created oxide. The case presented in this report is nickel rods embedded in alumina (Ni-Al₂O₃) exposed to temperatures in the range between 300 and 500 degrees Celsius from 1 to 500 hours. The rate of oxidation was found to be somewhat lower than previously reported for large particles and bulk nickel.

Citation Download Citation

Tuquabo Tesfamichael, Stefan K. Andersson, T. Chibuye, and Ewa Wackelgard "Oxidation kinetics for metal-dielectric films using IR optical measurements", Proc. SPIE 3138, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XV, (14 October 1997); https://doi.org/10.1117/12.290211

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