Surface roughness in sputtered tin oxide films studied by light scattering and atomic force microscopy

Tomas Lindstroem; Jan Isidorsson; Gunnar A. Niklasson

doi:10.1117/12.287804

26 September 1997 Surface roughness in sputtered tin oxide films studied by light scattering and atomic force microscopy

Tomas Lindstroem, Jan Isidorsson, Gunnar A. Niklasson

Author Affiliations +

Proceedings Volume 3141, Scattering and Surface Roughness; (1997) https://doi.org/10.1117/12.287804
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

A light scattering model, based on scalar perturbation diffraction theory, has been used to derive surface roughness information from measurements on transparent thin film samples. The method utilizes the spectral behavior of the diffusely scattered reflectance (transmittance) as compared to the total reflectance (transmittance). By studying interference effects within the film, i.e. correlated and uncorrelated interface roughness contributions, it is possible to separate the origin of the scattering and extract statistical data of the boundaries. In this study, sputtered tin oxide films deposited onto glass substrate has been investigated. Optical characterization was made with a spectroscopic total integrating sphere (TIS) instrument in the wavelength range 0.4 less than lambda less than 1.0 micrometer. Surface roughness data from the light scattering model was compared with atomic force microscope (AFM) measurements through the use of power spectral density (PSD) functions. The AFM measurements made it possible to determine surface roughness scaling properties of sputtered tin oxide thin films with respect to film thickness and scan length.

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Tomas Lindstroem, Jan Isidorsson, and Gunnar A. Niklasson "Surface roughness in sputtered tin oxide films studied by light scattering and atomic force microscopy", Proc. SPIE 3141, Scattering and Surface Roughness, (26 September 1997); https://doi.org/10.1117/12.287804

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