Control of polysilicon on-film particulates with on-product measurements

Judith B. Barker; Elizabeth E. Chain; Vincent E. Plachecki

doi:10.1117/12.284632

25 August 1997 Control of polysilicon on-film particulates with on-product measurements

Judith B. Barker, Elizabeth E. Chain, Vincent E. Plachecki

Proceedings Volume 3213, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III; (1997) https://doi.org/10.1117/12.284632
Event: Microelectronic Manufacturing, 1997, Austin, TX, United States

Abstract

Historically, a number of in-line particle measurements have been performed on separate test wafers included with product wafers during polysilicon processes. By performing film thickness and particulate measurements directly on product wafers, instead, a number of benefits accrue: (1) reduced test wafer usage, (2) reduced test wafer storage requirements, (3) reduced need for equipment to reclaim test wafers, (4) reduced need for direct labor to reclaim test wafers, and (5) reduced engineering 'false alarms' due to incorrectly processed test wafers. Implementation of on-product measurements for the polysilicon diffusion process required a number of changes in both philosophy and methodology. We show the necessary steps to implementation of on-product particle measurements with concern for overall manufacturing efficiency and the need to maintain appropriate control. Particle results from the Tencor 7600 Surfscan are presented.

Citation Download Citation

Judith B. Barker, Elizabeth E. Chain, and Vincent E. Plachecki "Control of polysilicon on-film particulates with on-product measurements", Proc. SPIE 3213, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, (25 August 1997); https://doi.org/10.1117/12.284632

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