Electron-beam lithography simulation for mask making: I

Chris A. Mack

doi:10.1117/12.301194

12 February 1997 Electron-beam lithography simulation for mask making: I

Chris A. Mack

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301194
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single 'pixel' energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a simulated three-dimensional resist pattern.

Citation Download Citation

Chris A. Mack "Electron-beam lithography simulation for mask making: I", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301194

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