Effects of structural differences in speed enhancers (dissolution promoters) on positive photoresist composition

Michelle M. Cook; M. Dalil Rahman; Ping-Hung Lu

doi:10.1117/12.312346

29 June 1998 Effects of structural differences in speed enhancers (dissolution promoters) on positive photoresist composition

Michelle M. Cook, M. Dalil Rahman, Ping-Hung Lu

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312346
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Several low molecular weight polyhydroxy phenolic compounds were used to study their effect on DNQ novolak photoresist compositions. These compounds used with fractionated novolak resins in a positive photoresist composition, tend to improve the photospeed, but in some cases degrades the other characteristics of the resist including resolution and depth of focus. Improvements in performance (photospeed, sidewall angle, resolution, and depth of focus) may depend on the structure of the speed enhancer. Speed enhancers were obtained commercially or synthesized, characterized by HPLC and NMR, and were formulated as i-line resists. The goal of these studies was to find out the relationship between the structure of the speed enhancer and the performance of the resist.

Citation Download Citation

Michelle M. Cook, M. Dalil Rahman, and Ping-Hung Lu "Effects of structural differences in speed enhancers (dissolution promoters) on positive photoresist composition", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312346

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