Paper
29 June 1998 Process and performance optimization of bottom antireflective coatings
Shuji Ding, Ping-Hung Lu, Jianhui Shan, Eleazar Gonzalez, Salem Mehtsun, Sunit S. Dixit, Dinesh N. Khanna
Author Affiliations +
Abstract
AZTM BARLiTM II materials are used as highly absorptive bottom antireflective coatings (BARC) for i-line lithographic applications. The BARC formulations consist of polymer-bound dyes with the additives formulated in photoresist compatible solvents, containing none of monomeric chromophores, and showing excellent coating uniformity. We have continued to study the functional performance of the BARC materials on swing reduction, lithography, coating surface defect, thermal stability, forced aging behavior, etc. Strategy of formulations and recommendations on standard processing conditions will also be discussed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shuji Ding, Ping-Hung Lu, Jianhui Shan, Eleazar Gonzalez, Salem Mehtsun, Sunit S. Dixit, and Dinesh N. Khanna "Process and performance optimization of bottom antireflective coatings", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312480
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KEYWORDS
Coating

Photoresist materials

Semiconducting wafers

Lithography

Bottom antireflective coatings

Silicon

Refractive index

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