Photosensitive polyamic acid composition for an interlayer isolation of integrated circuits

Nikolay G. Savinskij; Ludmila A. Tsvetkova; Polina G. Buyanovskaya

doi:10.1117/12.301408

1 January 1998 Photosensitive polyamic acid composition for an interlayer isolation of integrated circuits

Nikolay G. Savinskij, Ludmila A. Tsvetkova, Polina G. Buyanovskaya

Proceedings Volume 3347, Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media; (1998) https://doi.org/10.1117/12.301408
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation

Abstract

Optimization of photosensitive composition, investigation of film formation conditions and improvement negative polyimide photoresist properties is accomplished. Polyimide photoresist is suggested for producing an interlayer dielectric coating in high density interconnected modules and passivation layers due to a good electrical insulation properties, planarization, high thermal and chemical stability.

Citation Download Citation

Nikolay G. Savinskij, Ludmila A. Tsvetkova, and Polina G. Buyanovskaya "Photosensitive polyamic acid composition for an interlayer isolation of integrated circuits", Proc. SPIE 3347, Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media, (1 January 1998); https://doi.org/10.1117/12.301408

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