Tin oxide pattern deposition by laser direct writing

Tamas Szoerenyi; Zsolt Geretovszky; L. Kelemen; Jazsef Toth; Alen Simon

doi:10.1117/12.308612

26 May 1998 Tin oxide pattern deposition by laser direct writing

Tamas Szoerenyi, Zsolt Geretovszky, L. Kelemen, Jazsef Toth, Alen Simon

Proceedings Volume 3404, ALT'97 International Conference on Laser Surface Processing; (1998) https://doi.org/10.1117/12.308612
Event: ALT '97 International Conference on Laser Surface Processing, 1997, Limoges, France

Abstract

Tin oxide pattern generation by laser deposition from SnCl₄(DOT)5H₂O in isopropanol is reported. Smooth, even stripes of thicknesses ranging from 20 to 120 nm with sharp, well defined edges and cross-section are deposited by scanning an Ar⁺ laser beam ((lambda) equals 514.5 nm) focused onto the substrate--solution interface with a constant speed of 1 mm/s. The linewidth linearly increases from 26 to 42 micrometers with increasing the power from 40 to 120 mW. The reproducibility of pattern generation is extremely good as revealed by scanning electron microscopy, energy dispersive X-ray and micro-area Rutherford backscattering analyses. The minimum DC resistivity of 1.7(DOT)10^-2 (Omega) cm, measured without any process optimization, favorably compares with those reported for films prepared by other techniques. The chemical composition of the film material in SnO_x with 1.1 < x < 1.5 as determined by X-ray photoelectron spectroscopy.

Citation Download Citation

Tamas Szoerenyi, Zsolt Geretovszky, L. Kelemen, Jazsef Toth, and Alen Simon "Tin oxide pattern deposition by laser direct writing", Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); https://doi.org/10.1117/12.308612

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