Ion projection lithography

John Melngailis; Hans Loschner; Gerhard Stengl; Ivan L. Berry; Alfred A. Mondelli; Gerhard Gross

doi:10.1117/12.328849

1 September 1998 Ion projection lithography

John Melngailis, Hans Loschner, Gerhard Stengl, Ivan L. Berry, Alfred A. Mondelli, Gerhard Gross

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328849
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

In spite of the comparatively modest level of effort devoted to ion projection lithography, the results obtained so far indicate that the technology is highly promising. Accordingly, a $36M program has been launched in Europe to develop a full field, IPL process tool.

Citation Download Citation

John Melngailis, Hans Loschner, Gerhard Stengl, Ivan L. Berry, Alfred A. Mondelli, and Gerhard Gross "Ion projection lithography", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328849

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