Performance of the ALTA 3500 scanned-laser mask lithography system

Peter D. Buck; Alex H. Buxbaum; Thomas P. Coleman; Long Tran

doi:10.1117/12.328807

1 September 1998 Performance of the ALTA 3500 scanned-laser mask lithography system

Peter D. Buck, Alex H. Buxbaum, Thomas P. Coleman, Long Tran

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328807
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

The ALTA 3500, an advanced scanned-laser mask lithography tool produced by Etec, was introduced to the marketplace in September 1997. The system architecture was described and an initial performance evaluation was presented. This system, based on the ALTA 3000, uses a new 33.3X, 0.8 NA final reduction lens to reduce the spot size to 0.27 micrometers FWHM, thereby affording improved resolution and pattern acuity on the mask. To take advantage of the improved resolution, a new anisotropic chrome etch process has been developed and introduced along with change from Olin 895i resist to TOK iP3600 resist. In this paper we will more extensively describe the performance of the ALTA 3500 and the performance of these new processes.

Citation Download Citation

Peter D. Buck, Alex H. Buxbaum, Thomas P. Coleman, and Long Tran "Performance of the ALTA 3500 scanned-laser mask lithography system", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328807

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