Photochemical deposition of spacecraft material outgassing products

Dianne J. Coleman; Kenneth T. Luey

doi:10.1117/12.328505

27 October 1998 Photochemical deposition of spacecraft material outgassing products

Dianne J. Coleman, Kenneth T. Luey

Proceedings Volume 3427, Optical Systems Contamination and Degradation; (1998) https://doi.org/10.1117/12.328505
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

Laboratory measurements of photochemical deposition rates of outgassing products from Tefzel insulation have been conducted. We show that outgassing products from Tefzel insulation photodeposit under conditions of surface temperature and arrival rates for which bulk condensation will not occur. Normalized to the sample size, the photodeposition rate exceeds the reported condensable material outgassing rate. The result reported here strongly support the conclusion that photochemical deposition of contaminants from Tefzel is potentially a significant mechanism for degradation of thermal control surfaces on spacecraft.

Citation Download Citation

Dianne J. Coleman and Kenneth T. Luey "Photochemical deposition of spacecraft material outgassing products", Proc. SPIE 3427, Optical Systems Contamination and Degradation, (27 October 1998); https://doi.org/10.1117/12.328505

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