Laser-driven plasma CVD of thin films

Vitali I. Konov; Alexander M. Prokhorov; S. A. Uglov; A. P. Bolshakov; I. A. Leontiev; Friedrich Dausinger; Helmut Huegel; Birgit Angstenberger; Gerd Sepold; Simeon Metev

doi:10.1117/12.328191

20 October 1998 Laser-driven plasma CVD of thin films

Vitali I. Konov, Alexander M. Prokhorov, S. A. Uglov, A. P. Bolshakov, I. A. Leontiev, Friedrich Dausinger, Helmut Huegel, Birgit Angstenberger, Gerd Sepold, Simeon Metev

Author Affiliations +

Proceedings Volume 3484, Lasers in Synthesis, Characterization, and Processing of Diamond; (1998) https://doi.org/10.1117/12.328191
Event: Lasers in Synthesis, Characterization, and Processing of Diamond, 1997, Tashkent, Uzbekistan

Abstract

A novel technique for CVD synthesis of materials, that does not demand a vacuum chamber and provides high deposition rates, have been developed. It is based on CW CO₂-laser maintenance of a stationary optical discharge in a gas stream, exhausting over a substrate into the air. Nano- and polycrystalline diamond films were deposited on tungsten substrates from atmospherics pressure Xe(Ar):H₂:CH₄ gas mixtures at flow rates 2 1/min. 2,5 kW CO₂-laser focused beam produced plasma. Deposition area was about 1 cm² and growth rates up to 30-50 micrometers /hour. Peculiarities and advantages of laser plasmatrons are discussed.

Citation Download Citation

Vitali I. Konov, Alexander M. Prokhorov, S. A. Uglov, A. P. Bolshakov, I. A. Leontiev, Friedrich Dausinger, Helmut Huegel, Birgit Angstenberger, Gerd Sepold, and Simeon Metev "Laser-driven plasma CVD of thin films", Proc. SPIE 3484, Lasers in Synthesis, Characterization, and Processing of Diamond, (20 October 1998); https://doi.org/10.1117/12.328191

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