Pulsed-laser-driven plasma CVD of CN/BN compound films

Vladimir G. Ageev; M. V. Ugarov; E. N. Loubnin; Vitali I. Konov

doi:10.1117/12.328215

20 October 1998 Pulsed-laser-driven plasma CVD of CN/BN compound films

Vladimir G. Ageev, M. V. Ugarov, E. N. Loubnin, Vitali I. Konov

Proceedings Volume 3484, Lasers in Synthesis, Characterization, and Processing of Diamond; (1998) https://doi.org/10.1117/12.328215
Event: Lasers in Synthesis, Characterization, and Processing of Diamond, 1997, Tashkent, Uzbekistan

Abstract

The deposition of boron nitride and carbon nitride films by laser-induced plasma CVD was performed for the first time. The composition and structure of films grown in different experimental conditions was studied by methods of Raman spectroscopy and x-ray photoelectron spectroscopy. It was found that high fractions of sp³ C-N bonding in CN films and hexagonal type B-N bonding in BN films can be produced by this method. All the synthesized films were amorphous. The prospective for the development of B-C-N based compounds deposition by laser plasma technique is discussed.

Citation Download Citation

Vladimir G. Ageev, M. V. Ugarov, E. N. Loubnin, and Vitali I. Konov "Pulsed-laser-driven plasma CVD of CN/BN compound films", Proc. SPIE 3484, Lasers in Synthesis, Characterization, and Processing of Diamond, (20 October 1998); https://doi.org/10.1117/12.328215

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