Paper
19 August 1998 2D wavelet transform with different adaptive wavelet bases for texture defect inspection based on genetic algorithm
Hong Liu, Yu Long Mo
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Abstract
There are many textures such as woven fabrics having repeating Textron. In order to handle the textural characteristics of images with defects, this paper proposes a new method based on 2D wavelet transform. In the method, a new concept of different adaptive wavelet bases is used to match the texture pattern. The 2D wavelet transform has two different adaptive orthonormal wavelet bases for rows and columns which differ from Daubechies wavelet bases. The orthonormal wavelet bases for rows and columns are generated by genetic algorithm. The experiment result demonstrate the ability of the different adaptive wavelet bases to characterize the texture and locate the defects in the texture.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hong Liu and Yu Long Mo "2D wavelet transform with different adaptive wavelet bases for texture defect inspection based on genetic algorithm", Proc. SPIE 3561, Electronic Imaging and Multimedia Systems II, (19 August 1998); https://doi.org/10.1117/12.319751
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KEYWORDS
Wavelets

Wavelet transforms

Genetic algorithms

Defect inspection

Inspection

Digital filtering

Electronic filtering

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