Paper
23 April 1999 Experience with EFQM assessment at Siemens Mask Shop
Werner Reindl, Siegfried Steuber
Author Affiliations +
Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346221
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany
Abstract
The EFQM Management Self-Assessment was applied to mask manufacturing and was found to be the driving process for business improvements at the mask shop. It offered an opportunity to learn about the organisation's strengths and especially the areas where improvement was necessary.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Werner Reindl and Siegfried Steuber "Experience with EFQM assessment at Siemens Mask Shop", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346221
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KEYWORDS
Photomasks

Manufacturing

Roads

Semiconductors

Standards development

Silver

Lead

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