Paper
23 April 1999 Hierarchical mask data preparation and special fracturing techniques in MGS
B. Buerger, Uwe Baetz, Klaus-Dietmar Kunze, H. Wolf
Author Affiliations +
Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346217
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany
Abstract
MGS is a layout postprocessor software including a fracturing engine for Leica's ZBA e-beam writers. With the ZBA series including the new ZBA300 and its ability to write submicrometer masks for advanced technologies two main tasks have to be mastered in data preparation: (1) Processing of large and dense layouts. (2) Contribution to increased mask quality by optimized fracturing. These challenges are not restricted to the ZBA tools only; on the contrary they are of general interest for data preparation.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Buerger, Uwe Baetz, Klaus-Dietmar Kunze, and H. Wolf "Hierarchical mask data preparation and special fracturing techniques in MGS", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346217
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KEYWORDS
Magnesium

Photomasks

Algorithm development

Edge roughness

Integrated circuit design

Integrated circuits

Liquid crystals

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