X-ray lithography: a system integration effort

Robert A. Selzer; John Heaton; Yuli Vladimirsky; Klaus Simon

doi:10.1117/12.351164

25 June 1999 X-ray lithography: a system integration effort

Robert A. Selzer, John Heaton, Yuli Vladimirsky, Klaus Simon

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351164
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Despite growing expectations of significant progress in projection lithography using shorter wavelengths, x-ray lithography is still the most developed and production ready technology compared with the other NGL approaches. For the timely introduction of this technology into the manufacturing environment the development of fully integrated x-ray lithography systems becomes very important. Reflecting manufacturing and R and D demands, the x-ray technology integration has been pursued for goth synchrotron radiation and x-ray point source based approaches. While the synchrotron-based approach provides the high volume platform, the point source will provide the platform for low volume production and R and D efforts. SAL recognizes the needs for both, a synchrotron based stepper as well as a point source stepper and is focused on meeting those needs. This paper will present the status of integration efforts at SAL utilizing a point source system.

Citation Download Citation

Robert A. Selzer, John Heaton, Yuli Vladimirsky, and Klaus Simon "X-ray lithography: a system integration effort", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351164

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